In the field of biochemical deposition, the use of organic molecules to modify the interface between metal and high-permittivity (K) material is a recent development with a wealth of applications. Generally, there have been two main approaches to molecular control over electronic device properties: 1) control of the electrical potential at the interface...

Recently, efforts have been made to obtain larger capacitance values in capacitors of semiconductor devices using noble metals such as ruthenium (Ru), platinum (Pt), iridium (Ir), and osmium (Os) as a lower electrode or an upper electrode of a capacitor. Chemical vapor deposition (CVD) is often used to deposit this metal over the entire wafer surface....